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  Control of layer growth by substrate bias

Häberle, E., Kopecki, J., Mutzke, A., Schneider, R., Schulz, A., Walker, M., et al. (2010). Control of layer growth by substrate bias. In C. McKenna (Ed.), 37th European Physical Society Conference on Plasma Physics. Contributed Papers. Geneva: European Physical Society.

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P4.324.pdf (Any fulltext), 3MB
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 Creators:
Häberle, E.1, Author
Kopecki, J.1, Author
Mutzke, A.2, Author           
Schneider, R.2, Author           
Schulz, A.1, Author
Walker, M.1, Author
Stroth, U.3, Author           
Affiliations:
1Institut für Plasmaforschung, Universität Stuttgart, D-70569 Stuttgart, ou_persistent22              
2Stellarator Theory (ST), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856287              
3External Organizations, ou_persistent22              

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Language(s): eng - English
 Dates: 2010
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Internal
 Identifiers: eDoc: 516965
 Degree: -

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Title: 37th EPS Conference on Plasma Physics
Place of Event: Dublin
Start-/End Date: 2010-06-21 - 2010-06-25

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Title: 37th European Physical Society Conference on Plasma Physics. Contributed Papers
Source Genre: Proceedings
 Creator(s):
McKenna, C., Editor
Affiliations:
-
Publ. Info: Geneva : European Physical Society
Pages: CD-ROM Volume / Issue: - Sequence Number: P4.324 Start / End Page: - Identifier: ISBN: 2-914771-62-2

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Title: ECA
Source Genre: Series
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Pages: - Volume / Issue: 34A Sequence Number: P4.324 Start / End Page: - Identifier: -