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  Temperature dependence of the chemical sputtering of amorphous hydrogenated carbon films by hydrogen

Schlüter, M., Hopf, C., Schwarz-Selinger, T., & Jacob, W. (2008). Temperature dependence of the chemical sputtering of amorphous hydrogenated carbon films by hydrogen. Journal of Nuclear Materials, 376(1), 33-37. Retrieved from http://dx.doi.org/10.1016/j.jnucmat.2008.02.002.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0026-FF38-F Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0026-FF39-D
Genre: Journal Article

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 Creators:
Schlüter, M.1, Author           
Hopf, C.2, Author           
Schwarz-Selinger, T.3, Author           
Jacob, W.3, Author           
Affiliations:
1External Organizations, ou_persistent22              
2ITER Technology & Diagnostics (ITED), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856290              
3Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328              

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Language(s): eng - English
 Dates: 2008
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 324465
URI: http://dx.doi.org/10.1016/j.jnucmat.2008.02.002
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Title: Journal of Nuclear Materials
Source Genre: Journal
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Publ. Info: Elsevier
Pages: - Volume / Issue: 376 (1) Sequence Number: - Start / End Page: 33 - 37 Identifier: -