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  Chemical sputtering of carbon films by simultaneous irradiation with argon ions and molecular oxygen

Hopf, C., Schlüter, M., Schwarz-Selinger, T., von Toussaint, U., & Jacob, W. (2008). Chemical sputtering of carbon films by simultaneous irradiation with argon ions and molecular oxygen. New Journal of Physics, 10: 093022 (27pp). doi:10.1088/1367-2630/10/9/093022.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-0088-7 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-0089-5
Genre: Journal Article

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 Creators:
Hopf, C.1, Author           
Schlüter, M.2, Author           
Schwarz-Selinger, T.3, Author           
von Toussaint, U.3, Author           
Jacob, W.3, Author           
Affiliations:
1ITER Technology & Diagnostics (ITED), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856290              
2External Organizations, ou_persistent22              
3Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328              

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Language(s): eng - English
 Dates: 2008
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 362411
URI: http://www.iop.org/EJ/abstract/1367-2630/10/9/093022
DOI: 10.1088/1367-2630/10/9/093022
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Title: New Journal of Physics
Source Genre: Journal
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Publ. Info: IoP
Pages: - Volume / Issue: 10 Sequence Number: 093022 (27pp) Start / End Page: - Identifier: -