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  Al-Cr-O thin films as an efficient hydrogen barrier

Levchuk, D., Bolt, H., Döbeli, M., Eggenberger, S., Widrig, B., & Ramm, J. (2008). Al-Cr-O thin films as an efficient hydrogen barrier. Surface and Coatings Technology, 202(20), 5043-5047. doi:10.1016/j.surfcoat.2008.05.012.

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Levchuk_Al_Cr_O.pdf (Any fulltext), 739KB
 
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 Creators:
Levchuk, D.1, Author           
Bolt, H.1, Author           
Döbeli, M.2, Author
Eggenberger, S.2, Author
Widrig, B.2, Author
Ramm, J.2, Author
Affiliations:
1Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328              
2Ion Beam Physics, Paul Scherrer Institute and ETH Zurich, Schafmattstrasse 20, CH-8093 Zürich, Switzerland; OC Oerlikon Balzers AG, LI-9496 Balzers, Liechtenstein, ou_persistent22              

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Language(s): eng - English
 Dates: 2008
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 376486
DOI: 10.1016/j.surfcoat.2008.05.012
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Title: Surface and Coatings Technology
Source Genre: Journal
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Publ. Info: Elsevier B.V.
Pages: - Volume / Issue: 202 (20) Sequence Number: - Start / End Page: 5043 - 5047 Identifier: -