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  Ion chemistry in H2-Ar low temperature plasmas

Sode, M., Schwarz-Selinger, T., & Jacob, W. (2013). Ion chemistry in H2-Ar low temperature plasmas. Journal of Applied Physics, 114: 063302 (16pp). doi:10.1063/1.4817526.

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Sode, M.1, Author           
Schwarz-Selinger, T.1, Author           
Jacob, W.1, Author           
Affiliations:
1Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856327              

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Language(s): eng - English
 Dates: 2013
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 655951
DOI: 10.1063/1.4817526
URI: http://dx.doi.org/10.1063/1.4817526
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Title: Journal of Applied Physics
Source Genre: Journal
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Publ. Info: American Institute of Physics
Pages: - Volume / Issue: 114 Sequence Number: 063302 (16pp) Start / End Page: - Identifier: -