English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT
  Radical Impurity Mechanisms for Helium Incorporation into Buckminsterfullerene

Patchkovskii, S., & Thiel, W. (1997). Radical Impurity Mechanisms for Helium Incorporation into Buckminsterfullerene. Helvetica Chimica Acta, 80(2), 495-509. doi:10.1002/hlca.19970800214.

Item is

Files

show Files

Locators

show

Creators

show
hide
 Creators:
Patchkovskii, Serguei1, Author
Thiel, Walter1, Author           
Affiliations:
1Organisch-chemisches Institut, Universität Zürich, Winterthurerstrasse 190, CH-8057 Zürich, Switzerland, ou_persistent22              

Content

show
hide
Free keywords: -
 Abstract: Radical impurity mechanisms for incorporating He into C60 have been examined by semiempirical (MNDO) and density functional (BLYP/3-21G) calculations. The key step in these mechanisms is the insertion of He into C60X or C60X2 intermediates generated by adding the impurity X to C60 (X = H, Me in our model study). Contrary to C60 several window-type structures with one broken C,C bond exist as local minima on the MNDO potential surfaces of C60X and C60X2, but they are mechanistically irrelevant due to extremely facile ring closure. Effective activation barriers for the penetration of He through intact hexagons and various windows are reported for 65 different pathways in C60X and C60X2. Window-type transition states are stabilized significantly when there is a C-X bond involving a C-atom from the broken C,C bond. The corresponding barriers in C60X and C60X2 are much lower than in C60. This provides some theoretical support for the suggested impurity mechanisms even though the computed barriers for X = H, Me are still higher than indicated by the experiment (X unknown).

Details

show
hide
Language(s): eng - English
 Dates: 1996-12-182004-10-251997-03-24
 Publication Status: Issued
 Pages: 15
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1002/hlca.19970800214
 Degree: -

Event

show

Legal Case

show

Project information

show

Source 1

show
hide
Title: Helvetica Chimica Acta
  Abbreviation : Helv. Chim. Acta
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: Zürich : Verlag Helvetica Chimica Acta AG
Pages: - Volume / Issue: 80 (2) Sequence Number: - Start / End Page: 495 - 509 Identifier: ISSN: 0018-019X
CoNE: https://pure.mpg.de/cone/journals/resource/954925403620