Surface loss probabilities of the dominant neutral precursors for film growth 
in methane and acetylene discharges

Hopf, C.; Letourneur, K.; Jacob, W.; Schwarz-Selinger, T.; von Keudell, A.

doi:10.1063/1.124184

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Surface loss probabilities of the dominant neutral precursors for film growth in methane and acetylene discharges

Hopf, C., Letourneur, K., Jacob, W., Schwarz-Selinger, T., & von Keudell, A. (1999). Surface loss probabilities of the dominant neutral precursors for film growth in methane and acetylene discharges. Applied Physics Letters, 74(25), 3800-3802. doi:10.1063/1.124184.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8546-A Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8547-8

Genre: Journal Article

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Creators:
Hopf, C.¹, Author
Letourneur, K.², Author
Jacob, W.¹, Author
Schwarz-Selinger, T.¹, Author
von Keudell, A.¹, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2Department of Applied Physics, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands, ou_persistent22

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Language(s): eng - English

Dates: Date issued: 1999

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 625564
DOI: 10.1063/1.124184
URI: http://dx.doi.org/10.1063/1.124184

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Title: Applied Physics Letters

Source Genre: Journal

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Pages: - Volume / Issue: 74 (25) Sequence Number: - Start / End Page: 3800 - 3802 Identifier: -