Surface loss probabilities of the dominant neutral precursors for film growth 
in methane and acetylene discharges

Hopf, C.; Letourneur, K.; Jacob, W.; Schwarz-Selinger, T.; von Keudell, A.

doi:10.1063/1.124184

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Surface loss probabilities of the dominant neutral precursors for film growth in methane and acetylene discharges

Hopf, C., Letourneur, K., Jacob, W., Schwarz-Selinger, T., & von Keudell, A. (1999). Surface loss probabilities of the dominant neutral precursors for film growth in methane and acetylene discharges. Applied Physics Letters, 74(25), 3800-3802. doi:10.1063/1.124184.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8546-A Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8547-8

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Urheber:
Hopf, C.¹, Autor
Letourneur, K.², Autor
Jacob, W.¹, Autor
Schwarz-Selinger, T.¹, Autor
von Keudell, A.¹, Autor

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2Department of Applied Physics, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands, ou_persistent22