Chemical sputtering yields of carbon based materials at high ion flux densities

Grote, H.; Bohmeyer, W.; Kornejew, P.; Reiner, H. D.; Fussmann, G.; Schlöogl, R.; Weinberg, G.; Wu, C. H.

doi:10.1016/S0022-3115(98)00854-X

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Chemical sputtering yields of carbon based materials at high ion flux densities

Grote, H., Bohmeyer, W., Kornejew, P., Reiner, H. D., Fussmann, G., Schlöogl, R., et al. (1999). Chemical sputtering yields of carbon based materials at high ion flux densities. Journal of Nuclear Materials, 266-269, 1059-1064. doi:10.1016/S0022-3115(98)00854-X.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-859A-E Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-EE94-C

Genre: Journal Article

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Creators:
Grote, H.¹, Author
Bohmeyer, W.², Author
Kornejew, P.², Author
Reiner, H. D.³, Author
Fussmann, G.², Author
Schlöogl, R.⁴, Author
Weinberg, G.⁴, Author
Wu, C. H.⁴, Author

Affiliations:
1W7-X: Construction, Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856314
2Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856324
3Max Planck Society, ou_persistent13
4Fritz-Haber-Institut der Max-Planck Gesellschaft, Faradayweg 4, D-14195 Berlin, Germany; NET Team, Max-Planck-Institut für Plasmaphysik, EURATOM Association, Boltzmannstr. 2, D-85748 Garching, Germany, ou_persistent22

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Free keywords: 13th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 13), San Diego, CA, 1998-05-18 to 1998-05-22

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Language(s): eng - English

Dates: Date issued: 1999

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 625628
DOI: 10.1016/S0022-3115(98)00854-X
URI: http://dx.doi.org/10.1016/S0022-3115(98)00854-X

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Title: Journal of Nuclear Materials

Source Genre: Journal

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Pages: - Volume / Issue: 266-269 Sequence Number: - Start / End Page: 1059 - 1064 Identifier: -