Angular dependence of the sputtering yield of rough beryllium surfaces

Küstner, M.; Eckstein, W.; Hechtl, E.; Roth, J.

doi:10.1016/S0022-3115(98)00648-5

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Angular dependence of the sputtering yield of rough beryllium surfaces

Küstner, M., Eckstein, W., Hechtl, E., & Roth, J. (1999). Angular dependence of the sputtering yield of rough beryllium surfaces. Journal of Nuclear Materials, 265(1-2), 22-27. doi:10.1016/S0022-3115(98)00648-5.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-85F9-9 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-85FA-7

Genre: Journal Article

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Creators:
Küstner, M.¹, Author
Eckstein, W.², Author
Hechtl, E.³, Author
Roth, J.^{2, 4}, Author

Affiliations:
1External Organizations, ou_persistent22
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
3Technische Universität, Lichtenbergstr.4, D-85747 Garching, bei München, Germany, ou_persistent22
4Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328

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Language(s): eng - English

Dates: Date issued: 1999

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 626162
DOI: 10.1016/S0022-3115(98)00648-5
URI: http://dx.doi.org/10.1016/S0022-3115(98)00648-5

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Title: Journal of Nuclear Materials

Source Genre: Journal

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Pages: - Volume / Issue: 265 (1-2) Sequence Number: - Start / End Page: 22 - 27 Identifier: -