Depth of origin of sputtered atoms for elemental targets

Shulga, V. I.; Eckstein, W.

doi:10.1016/S0168-583X(98)00626-0

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Depth of origin of sputtered atoms for elemental targets

Shulga, V. I., & Eckstein, W. (1998). Depth of origin of sputtered atoms for elemental targets. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 145(4), 492-502. doi:10.1016/S0168-583X(98)00626-0.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-87C5-9 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-87C6-7

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Urheber:
Shulga, V. I.¹, Autor
Eckstein, W.², Autor

Affiliations:
1Institute of Nuclear Physics, Moscow State University, 119899 Moscow, Russian Federation, ou_persistent22
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288