Physical sputtering and reflection processes in plasma-wall interactions

Eckstein, W.

doi:10.1016/S0022-3115(97)00109-8

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Physical sputtering and reflection processes in plasma-wall interactions

Eckstein, W. (1997). Physical sputtering and reflection processes in plasma-wall interactions. Journal of Nuclear Materials, 248, 1-8. doi:10.1016/S0022-3115(97)00109-8.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-89A3-3 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-89A4-1

Genre: Journal Article

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Creators:
Eckstein, W.¹, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Free keywords: International Workshop on Interfacial Effects in Quantum Engineering Systems (IEQES096), MITO, JAPAN, 1996-08-21 to 1996-08-23

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Language(s): eng - English

Dates: Date issued: 1997

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 624613
DOI: 10.1016/S0022-3115(97)00109-8
URI: http://dx.doi.org/10.1016/S0022-3115(97)00109-8

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Title: Journal of Nuclear Materials

Source Genre: Journal

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Pages: - Volume / Issue: 248 Sequence Number: - Start / End Page: 1 - 8 Identifier: -