Deposition of amorphous hydrogenated carbon films due to hydrocarbon molecule 
ion-beam bombardment

Wang, W.; Roth, J.; Eckstein, W.; Schwoerer, R.; Plank, H.; Du, M.

doi:10.1016/S0168-583X(97)00190-0

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Deposition of amorphous hydrogenated carbon films due to hydrocarbon molecule ion-beam bombardment

Wang, W., Roth, J., Eckstein, W., Schwoerer, R., Plank, H., & Du, M. (1997). Deposition of amorphous hydrogenated carbon films due to hydrocarbon molecule ion-beam bombardment. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 129(2), 210-216. doi:10.1016/S0168-583X(97)00190-0.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-89B9-4 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-89BA-2

Genre: Zeitschriftenartikel

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Urheber:
Wang, W.¹, Autor
Roth, J.², Autor
Eckstein, W.², Autor
Schwoerer, R.³, Autor
Plank, H.², Autor
Du, M., Autor

Affiliations:
1Max Planck Society, ou_persistent13
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
3External Organizations, ou_persistent22