Stability of plasma-deposited amorphous hydrogenated boron films

Annen, A.; Sass, M.; Beckmann, R.; Jacob, W.

doi:10.1016/S0040-6090(96)09500-4

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Stability of plasma-deposited amorphous hydrogenated boron films

Annen, A., Sass, M., Beckmann, R., & Jacob, W. (1997). Stability of plasma-deposited amorphous hydrogenated boron films. Thin Solid Films, 300(1-2), 101-106. doi:10.1016/S0040-6090(96)09500-4.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-89E8-9 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-89E9-7

Genre: Journal Article

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Creators:
Annen, A.¹, Author
Sass, M.², Author
Beckmann, R.³, Author
Jacob, W.¹, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2External Organizations, ou_persistent22
3Max Planck Society, ou_persistent13

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Language(s): eng - English

Dates: Date issued: 1997

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 624705
DOI: 10.1016/S0040-6090(96)09500-4
URI: http://www.sciencedirect.com/science/article/pii/S0040609096095004

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Title: Thin Solid Films

Source Genre: Journal

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Pages: - Volume / Issue: 300 (1-2) Sequence Number: - Start / End Page: 101 - 106 Identifier: -