Deposition and characterization of dense and stable amorphous hydrogenated 
boron films at low substrate temperatures

Annen, A.; Beckmann, R.; Jacob, W.

doi:10.1016/S0022-3093(96)00568-6

Local TagsRelease HistoryDetailsSummary

Deposition and characterization of dense and stable amorphous hydrogenated boron films at low substrate temperatures

Annen, A., Beckmann, R., & Jacob, W. (1997). Deposition and characterization of dense and stable amorphous hydrogenated boron films at low substrate temperatures. Journal of Non-Crystalline Solids, 209(3), 240-246. doi:10.1016/S0022-3093(96)00568-6.

Item is Released

show all hide all

Basic

show hide

Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8A4B-5 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8A4C-3

Genre: Journal Article

Files

show Files

Locators

show

Creators

show

hide

Creators:
Annen, A.¹, Author
Beckmann, R.², Author
Jacob, W.¹, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2Max Planck Society, ou_persistent13

Content

show

Details

show

hide

Language(s): eng - English

Dates: Date issued: 1997

Publication Status: Issued

Pages: -

Publishing info: -

Table of Contents: -

Rev. Type: Peer

Identifiers: eDoc: 625192
DOI: 10.1016/S0022-3093(96)00568-6
URI: http://www.sciencedirect.com/science/article/pii/S0022309396005686

Degree: -

Event

show

Legal Case

show

Project information

show

Source 1

show

hide

Title: Journal of Non-Crystalline Solids

Source Genre: Journal

Creator(s):

Affiliations:

Publ. Info: -

Pages: - Volume / Issue: 209 (3) Sequence Number: - Start / End Page: 240 - 246 Identifier: -