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  Deposition and hydrogen content of carbon films grown by CH+3 ion‐beam bombardment

Plank, H., Wang, W., Eckstein, W., Schwörer, R., Steffen, H. J., & Roth, J. (1995). Deposition and hydrogen content of carbon films grown by CH+3 ion‐beam bombardment. Journal of Applied Physics, 78(9), 5366-5372. doi:10.1063/1.359717.

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 Creators:
Plank, H.1, Author              
Wang, W.2, Author
Eckstein, W.1, Author              
Schwörer, R.1, Author              
Steffen, H. J.2, Author
Roth, J.1, Author              
Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              
2Max Planck Society, ou_persistent13              

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Language(s): eng - English
 Dates: 1995
 Publication Status: Published in print
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Degree: -

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Title: Journal of Applied Physics
Source Genre: Journal
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Pages: - Volume / Issue: 78 (9) Sequence Number: - Start / End Page: 5366 - 5372 Identifier: -