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  Mechanisms of the Deposition of Hydrogenated Carbon Films

Möller, W., Fukarek, W., Lange, K., Keudell, A. v., & Jacob, W. (1995). Mechanisms of the Deposition of Hydrogenated Carbon Films. Japanese Journal of Applied Physics Part 1: Regular Papers, Short Notes & Review Papers, 34(4B), 2163-2171. doi:10.1143/JJAP.34.2163.

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 Creators:
Möller, W.1, Author              
Fukarek, W., Author
Lange, K.2, Author              
Keudell, A. von1, Author              
Jacob, W.1, Author              
Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              
2External Organizations, ou_persistent22              

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Free keywords: 16th Dry Process Symposium (DPS 1994), 1994-11-10 to 1994-11-11
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Language(s): eng - English
 Dates: 1995
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 627807
DOI: 10.1143/JJAP.34.2163
URI: http://jjap.jsap.jp/link?JJAP/34/2163/
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Title: Japanese Journal of Applied Physics Part 1: Regular Papers, Short Notes & Review Papers
Source Genre: Journal
 Creator(s):
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Publ. Info: -
Pages: - Volume / Issue: 34 (4B) Sequence Number: - Start / End Page: 2163 - 2171 Identifier: -