Mechanisms of the Deposition of Hydrogenated Carbon Films

Möller, W.; Fukarek, W.; Lange, K.; Keudell, A. von; Jacob, W.

doi:10.1143/JJAP.34.2163

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Mechanisms of the Deposition of Hydrogenated Carbon Films

Möller, W., Fukarek, W., Lange, K., Keudell, A. v., & Jacob, W. (1995). Mechanisms of the Deposition of Hydrogenated Carbon Films. Japanese Journal of Applied Physics Part 1: Regular Papers, Short Notes & Review Papers, 34(4B), 2163-2171. doi:10.1143/JJAP.34.2163.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8EF9-1 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8EFA-0

Genre: Journal Article

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Creators:
Möller, W.¹, Author
Fukarek, W., Author
Lange, K.², Author
Keudell, A. von¹, Author
Jacob, W.¹, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2External Organizations, ou_persistent22

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Free keywords: 16th Dry Process Symposium (DPS 1994), 1994-11-10 to 1994-11-11

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Language(s): eng - English

Dates: Date issued: 1995

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 627807
DOI: 10.1143/JJAP.34.2163
URI: http://jjap.jsap.jp/link?JJAP/34/2163/

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Title: Japanese Journal of Applied Physics Part 1: Regular Papers, Short Notes & Review Papers

Source Genre: Journal

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Pages: - Volume / Issue: 34 (4B) Sequence Number: - Start / End Page: 2163 - 2171 Identifier: -