The origin of reduced chemical erosion of graphite based materials induced by 
boron doping

Schenk, A.; Winter, B.; Lutterloh, C.; Biener, J.; Schubert, U. A.; Küppers, J.

doi:10.1016/0022-3115(94)00620-2

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The origin of reduced chemical erosion of graphite based materials induced by boron doping

Schenk, A., Winter, B., Lutterloh, C., Biener, J., Schubert, U. A., & Küppers, J. (1995). The origin of reduced chemical erosion of graphite based materials induced by boron doping. Journal of Nuclear Materials, 220-222, 767-770. doi:10.1016/0022-3115(94)00620-2.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8F11-0 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-FAB0-7

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Urheber:
Schenk, A.¹, Autor
Winter, B.², Autor
Lutterloh, C.¹, Autor
Biener, J.¹, Autor
Schubert, U. A.³, Autor
Küppers, J.¹, Autor

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2External Organizations, ou_persistent22
3Max Planck Society, ou_persistent13

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Schlagwörter: 11th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 11), Mito, Japan, 1994-05-23 to 1994-05-27

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