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  Role of hydrogen ions in plasma‐enhanced chemical vapor deposition of hydrocarbon films, investigated by in situ ellipsometry

Keudell, A. v., Jacob, W., & Fukarek, W. (1995). Role of hydrogen ions in plasma‐enhanced chemical vapor deposition of hydrocarbon films, investigated by in situ ellipsometry. Applied Physics Letters, 66(11), 1322-1324. doi:10.1063/1.113229.

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 Creators:
Keudell, A. von1, Author           
Jacob, W.1, Author           
Fukarek, W., Author
Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              

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Language(s): eng - English
 Dates: 1995
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Degree: -

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Title: Applied Physics Letters
Source Genre: Journal
 Creator(s):
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Publ. Info: -
Pages: - Volume / Issue: 66 (11) Sequence Number: - Start / End Page: 1322 - 1324 Identifier: -