Role of hydrogen ions in plasma‐enhanced chemical vapor deposition of 
hydrocarbon films, investigated by in situ ellipsometry

Keudell, A. von; Jacob, W.; Fukarek, W.

doi:10.1063/1.113229

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Role of hydrogen ions in plasma‐enhanced chemical vapor deposition of hydrocarbon films, investigated by in situ ellipsometry

Keudell, A. v., Jacob, W., & Fukarek, W. (1995). Role of hydrogen ions in plasma‐enhanced chemical vapor deposition of hydrocarbon films, investigated by in situ ellipsometry. Applied Physics Letters, 66(11), 1322-1324. doi:10.1063/1.113229.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8F21-C Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8F22-A

Genre: Journal Article

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Creators:
Keudell, A. von¹, Author
Jacob, W.¹, Author
Fukarek, W., Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Language(s): eng - English

Dates: Date issued: 1995

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 627900
DOI: 10.1063/1.113229
URI: http://apl.aip.org/resource/1/applab/v66/i11/p1322_s1

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Title: Applied Physics Letters

Source Genre: Journal

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Pages: - Volume / Issue: 66 (11) Sequence Number: - Start / End Page: 1322 - 1324 Identifier: -