H atom impact induced chemical erosion reaction at C:H film surfaces

Horn, A.; Schenk, A.; Biener, J.; Winter, B.; Lutterloh, C.; Wittmann, M.; Küppers, J.

doi:10.1016/0009-2614(94)01233-4

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H atom impact induced chemical erosion reaction at C:H film surfaces

Horn, A., Schenk, A., Biener, J., Winter, B., Lutterloh, C., Wittmann, M., et al. (1994). H atom impact induced chemical erosion reaction at C:H film surfaces. Chemical Physics Letters, 231(2-3), 193-198. doi:10.1016/0009-2614(94)01233-4.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-9001-D Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-9002-B

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Urheber:
Horn, A.¹, Autor
Schenk, A.¹, Autor
Biener, J.¹, Autor
Winter, B.², Autor
Lutterloh, C.¹, Autor
Wittmann, M.¹, Autor
Küppers, J.¹, Autor

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2External Organizations, ou_persistent22