H atom impact induced chemical erosion reaction at C:H film surfaces

Horn, A.; Schenk, A.; Biener, J.; Winter, B.; Lutterloh, C.; Wittmann, M.; Küppers, J.

doi:10.1016/0009-2614(94)01233-4

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H atom impact induced chemical erosion reaction at C:H film surfaces

Horn, A., Schenk, A., Biener, J., Winter, B., Lutterloh, C., Wittmann, M., et al. (1994). H atom impact induced chemical erosion reaction at C:H film surfaces. Chemical Physics Letters, 231(2-3), 193-198. doi:10.1016/0009-2614(94)01233-4.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-9001-D Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-9002-B

Genre: Journal Article

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Creators:
Horn, A.¹, Author
Schenk, A.¹, Author
Biener, J.¹, Author
Winter, B.², Author
Lutterloh, C.¹, Author
Wittmann, M.¹, Author
Küppers, J.¹, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2External Organizations, ou_persistent22

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Language(s): eng - English

Dates: Date issued: 1994

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 628150
DOI: 10.1016/0009-2614(94)01233-4
URI: http://www.sciencedirect.com/science/article/pii/0009261494012334#

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Title: Chemical Physics Letters

Source Genre: Journal

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Pages: - Volume / Issue: 231 (2-3) Sequence Number: - Start / End Page: 193 - 198 Identifier: -