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  In situ characterization of plasma‐deposited a‐C:H thin films by spectroscopic infrared ellipsometry

Friedl, A., Fukarek, W., Möller, W., & Koch, A. (1994). In situ characterization of plasma‐deposited a‐C:H thin films by spectroscopic infrared ellipsometry. Review of Scientific Instruments, 65(9), 2882-2889. doi:10.1063/1.1144632.

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 Creators:
Friedl, A.1, Author              
Fukarek, W.2, Author
Möller, W.3, Author              
Koch, A., Author
Affiliations:
1External Organizations, ou_persistent22              
2Max Planck Society, ou_persistent13              
3Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              

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Language(s): eng - English
 Dates: 1994
 Publication Status: Published in print
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Degree: -

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Title: Review of Scientific Instruments
Source Genre: Journal
 Creator(s):
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Publ. Info: -
Pages: - Volume / Issue: 65 (9) Sequence Number: - Start / End Page: 2882 - 2889 Identifier: -