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  A combined plasma‐surface model for the deposition of C:H films from a methane plasma

Keudell, A. v., & Möller, W. (1994). A combined plasma‐surface model for the deposition of C:H films from a methane plasma. Journal of Applied Physics, 75(12), 7718-7727. doi:10.1063/1.356603.

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 Creators:
Keudell, A. von1, Author              
Möller, W.1, Author              
Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              

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Language(s): eng - English
 Dates: 1994
 Publication Status: Published in print
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Degree: -

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Title: Journal of Applied Physics
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 75 (12) Sequence Number: - Start / End Page: 7718 - 7727 Identifier: -