A combined plasma‐surface model for the deposition of C:H films from a methane 
plasma

Keudell, A. von; Möller, W.

doi:10.1063/1.356603

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A combined plasma‐surface model for the deposition of C:H films from a methane plasma

Keudell, A. v., & Möller, W. (1994). A combined plasma‐surface model for the deposition of C:H films from a methane plasma. Journal of Applied Physics, 75(12), 7718-7727. doi:10.1063/1.356603.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-9079-1 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-907A-0

Genre: Journal Article

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Creators:
Keudell, A. von¹, Author
Möller, W.¹, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Language(s): eng - English

Dates: Date issued: 1994

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 629255
DOI: 10.1063/1.356603
URI: http://jap.aip.org/resource/1/japiau/v75/i12/p7718_s1

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Title: Journal of Applied Physics

Source Genre: Journal

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Pages: - Volume / Issue: 75 (12) Sequence Number: - Start / End Page: 7718 - 7727 Identifier: -