Application of dynamic in situ ellipsometry to the deposition of tin‐doped 
indium oxide films by reactive direct‐current magnetron sputtering

Fukarek, W.; Kersten, H.

doi:10.1116/1.579162

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Application of dynamic in situ ellipsometry to the deposition of tin‐doped indium oxide films by reactive direct‐current magnetron sputtering

Fukarek, W., & Kersten, H. (1994). Application of dynamic in situ ellipsometry to the deposition of tin‐doped indium oxide films by reactive direct‐current magnetron sputtering. Journal of Vacuum Science and Technology A: Vacuum Surfaces and Films, 12(2), 523-528. doi:10.1116/1.579162.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-90A9-4 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-90AA-2

Genre: Journal Article

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Creators:
Fukarek, W.¹, Author
Kersten, H., Author

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1Max Planck Society, ou_persistent13

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Language(s): eng - English

Dates: Date issued: 1994

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 629669
DOI: 10.1116/1.579162
URI: http://avspublications.org/jvsta/resource/1/jvtad6/v12/i2/p523_s1

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Title: Journal of Vacuum Science and Technology A: Vacuum Surfaces and Films

Source Genre: Journal

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Pages: - Volume / Issue: 12 (2) Sequence Number: - Start / End Page: 523 - 528 Identifier: -