Aufbau eines in-situ-IR-Spektralellipsometers zur Charakterisierung 
plasmadeponierter C:H-Schichten.- Design of an in-situ spectroscopic IR 
ellipsometer for characterization of plasma-deposited C:H films.

Friedl, A.

Local TagsRelease HistoryDetailsSummary

Aufbau eines in-situ-IR-Spektralellipsometers zur Charakterisierung plasmadeponierter C:H-Schichten.- Design of an in-situ spectroscopic IR ellipsometer for characterization of plasma-deposited C:H films.

Friedl, A. (1994). Aufbau eines in-situ-IR-Spektralellipsometers zur Charakterisierung plasmadeponierter C:H-Schichten.- Design of an in-situ spectroscopic IR ellipsometer for characterization of plasma-deposited C:H films. PhD Thesis, Technische Universität München, München (DE).

Item is Released

show all

Basic

hide

Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-9144-F Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-9145-D

Genre: Thesis

Files

show Files

Locators

show

Creators

hide

Creators:
Friedl, A.¹, Author

Affiliations:
1External Organizations, ou_persistent22

Content

show

Details

hide

Language(s): deu - German

Dates: Accepted: 1994

Publication Status: Accepted / In Press

Pages: 93 p.

Publishing info: München (DE) : Technische Universität München

Table of Contents: -

Rev. Type: -

Identifiers: eDoc: 655282
Other: IPP 4/267

Degree: PhD

Event

show

Legal Case

show

Project information

show

Source

show