Sputtering yield increase with target temperature for Ag

Behrisch, R.; Eckstein, W.

doi:10.1016/0168-583X(93)96027-A

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Sputtering yield increase with target temperature for Ag

Behrisch, R., & Eckstein, W. (1993). Sputtering yield increase with target temperature for Ag. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 82(2), 255-258. doi:10.1016/0168-583X(93)96027-A.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-9265-C Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-9266-A

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Urheber:
Behrisch, R.¹, Autor
Eckstein, W.¹, Autor

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Schlagwörter: Symposium on Fundamental Processes in Sputtering of Atoms and Molecules, on the Occasion of the 250th Anniversary of the Royal Academy of Science and Letters, Copenhagen, Denmark, 1992-08-30 to 1992-09-04

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