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  Plasma-Enhanced Chemical-Vapor-Deposition

Möller, W. (1993). Plasma-Enhanced Chemical-Vapor-Deposition. Applied Physics A - Materials Science & Processing, 56(6), 469-469. doi:10.1007/BF00331397.

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 Creators:
Möller, W.1, Author           
Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              

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Language(s): eng - English
 Dates: 1993
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 633798
DOI: 10.1007/BF00331397
 Degree: -

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Title: Applied Physics A - Materials Science & Processing
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 56 (6) Sequence Number: - Start / End Page: 469 - 469 Identifier: -