Simple source of atomic hydrogen for ultrahigh vacuum applications

Bischler, U.; Bertel, E.

doi:10.1116/1.578754

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Simple source of atomic hydrogen for ultrahigh vacuum applications

Bischler, U., & Bertel, E. (1993). Simple source of atomic hydrogen for ultrahigh vacuum applications. Journal of Vacuum Science and Technology A: Vacuum Surfaces and Films, 11(2), 458-460. doi:10.1116/1.578754.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-92DF-D Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-92E0-7

Genre: Journal Article

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Creators:
Bischler, U.¹, Author
Bertel, E.², Author

Affiliations:
1External Organizations, ou_persistent22
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Language(s): eng - English

Dates: Date issued: 1993

Publication Status: Issued

Pages: -

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Table of Contents: -

Rev. Type: Peer

Identifiers: eDoc: 647839
DOI: 10.1116/1.578754
URI: http://avspublications.org/jvsta/resource/1/jvtad6/v11/i2/p458_s1

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Title: Journal of Vacuum Science and Technology A: Vacuum Surfaces and Films

Source Genre: Journal

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Pages: - Volume / Issue: 11 (2) Sequence Number: - Start / End Page: 458 - 460 Identifier: -