Chemical sputtering of pyrolytic graphite and boron doped graphite USB15 at 
energies between 10 and 1000 eV

Garcia-Rosales, C.; Roth, J.

doi:10.1016/S0022-3115(06)80101-7

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Chemical sputtering of pyrolytic graphite and boron doped graphite USB15 at energies between 10 and 1000 eV

Garcia-Rosales, C., & Roth, J. (1992). Chemical sputtering of pyrolytic graphite and boron doped graphite USB15 at energies between 10 and 1000 eV. Journal of Nuclear Materials, 196-198, 573-576. doi:10.1016/S0022-3115(06)80101-7.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-945E-A Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-E2C0-6

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Urheber:
Garcia-Rosales, C.¹, Autor
Roth, J.¹, Autor

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Schlagwörter: 10th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 10), Montery, CA, 1992-03-30 to 1992-04-03

Zusammenfassung: -