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  Low energy helium implantation in evaporated nickel surfaces

Nygren, R. E., Doyle, B. L., Walsh, D. S., Ottenberger, W., Brooks, J. N., & Krauss, A. (1992). Low energy helium implantation in evaporated nickel surfaces. Journal of Nuclear Materials, 196-198, 558-563. doi:10.1016/S0022-3115(06)80098-X.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-947E-4 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-E321-6
Genre: Journal Article

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 Creators:
Nygren, R. E.1, Author
Doyle, B. L.2, Author
Walsh, D. S.1, Author
Ottenberger, W.3, Author           
Brooks, J. N.1, Author
Krauss, A.1, Author
Affiliations:
1External Organizations, ou_persistent22              
2Max Planck Institute for Plasma Physics, Max Planck Society, Boltzmannstraße 2, D-85748 Garching, DE, ou_1856284              
3Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              

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Free keywords: 10th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 10), Montery, CA, 1992-03-30 to 1992-04-03
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Language(s): eng - English
 Dates: 1992
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 657903
DOI: 10.1016/S0022-3115(06)80098-X
URI: http://www.sciencedirect.com/science/article/pii/S002231150680098X
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Title: Journal of Nuclear Materials
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 196-198 Sequence Number: - Start / End Page: 558 - 563 Identifier: -