Low energy helium implantation in evaporated nickel surfaces

Nygren, R. E.; Doyle, B. L.; Walsh, D. S.; Ottenberger, W.; Brooks, J. N.; Krauss, A.

doi:10.1016/S0022-3115(06)80098-X

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Low energy helium implantation in evaporated nickel surfaces

Nygren, R. E., Doyle, B. L., Walsh, D. S., Ottenberger, W., Brooks, J. N., & Krauss, A. (1992). Low energy helium implantation in evaporated nickel surfaces. Journal of Nuclear Materials, 196-198, 558-563. doi:10.1016/S0022-3115(06)80098-X.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-947E-4 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-E321-6

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Urheber:
Nygren, R. E.¹, Autor
Doyle, B. L.², Autor
Walsh, D. S.¹, Autor
Ottenberger, W.³, Autor
Brooks, J. N.¹, Autor
Krauss, A.¹, Autor

Affiliations:
1External Organizations, ou_persistent22
2Max Planck Institute for Plasma Physics, Max Planck Society, Boltzmannstraße 2, D-85748 Garching, DE, ou_1856284
3Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Schlagwörter: 10th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 10), Montery, CA, 1992-03-30 to 1992-04-03

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