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  Mechanism of chemical erosion of sputter‐deposited C:H films

Schenk, A., Biener, J., Winter, B., Lutterloh, C., Schubert, U. A., & Küppers, J. (1992). Mechanism of chemical erosion of sputter‐deposited C:H films. Applied Physics Letters, 61(20), 2414-2416. doi:10.1063/1.108182.

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 Creators:
Schenk, A.1, Author           
Biener, J.1, Author           
Winter, B.1, Author           
Lutterloh, C.1, Author           
Schubert, U. A.2, Author
Küppers, J.1, Author           
Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              
2Max Planck Society, ou_persistent13              

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Language(s): eng - English
 Dates: 1992
 Publication Status: Published in print
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Degree: -

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Title: Applied Physics Letters
Source Genre: Journal
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Pages: - Volume / Issue: 61 (20) Sequence Number: - Start / End Page: 2414 - 2416 Identifier: -