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  Formation of a modulated void structure in heavy-ion-irradiated amorphous silicon

Fratzl, P., Klaumünzer, S., Rammensee, M., & Vogl, G. (1990). Formation of a modulated void structure in heavy-ion-irradiated amorphous silicon. Europhysics Letters, 11(6), 547-553. doi:10.1209/0295-5075/11/6/011.

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Fratzl, P.1, Author              
Klaumünzer, S2, Author
Rammensee, M2, Author
Vogl, G2, Author
Affiliations:
1External Organizations, ou_persistent22              
2external, ou_persistent22              

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 Dates: 1990-03-15
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: ISI: A1990CV80000011
DOI: 10.1209/0295-5075/11/6/011
PMID: 0021
 Degree: -

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Title: Europhysics Letters
  Other : EPL
Source Genre: Journal
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Publ. Info: Bristol : IoPP
Pages: - Volume / Issue: 11 (6) Sequence Number: - Start / End Page: 547 - 553 Identifier: Other: 0295-5075