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  The Mechanism of Electrochemical Oxygen Reduction: A Combined DFT and in-Situ ATR-IR Study on Model Semiconductor Surfaces Ge(100) and ZnO

Biedermann, P. U., Nayak, S., & Erbe, A. (2015). The Mechanism of Electrochemical Oxygen Reduction: A Combined DFT and in-Situ ATR-IR Study on Model Semiconductor Surfaces Ge(100) and ZnO. Talk presented at 227th ECS Meeting. Chicago, IL, USA. 2015-05-24 - 2015-05-28.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0027-AE3A-F Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0027-AE3B-D
Genre: Talk

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 Creators:
Biedermann, Paul Ulrich1, Author              
Nayak, Simantini2, Author              
Erbe, Andreas2, Author              
Affiliations:
1Atomistic Modelling, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863350              
2Interface Spectroscopy, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863358              

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Language(s): eng - English
 Dates: 2015-05
 Publication Status: Not specified
 Pages: -
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 Table of Contents: -
 Rev. Type: -
 Identifiers: -
 Degree: -

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Title: 227th ECS Meeting
Place of Event: Chicago, IL, USA
Start-/End Date: 2015-05-24 - 2015-05-28

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