Temperature induced faceted hole formation in epitaxial Al thin films on 
sapphire

Hieke, Stefan Werner; Dehm, Gerhard; Scheu, Christina

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Temperature induced faceted hole formation in epitaxial Al thin films on sapphire

Hieke, S. W., Dehm, G., & Scheu, C. (2015). Temperature induced faceted hole formation in epitaxial Al thin films on sapphire. Poster presented at 8th International Conference on High Temperature Capillarity (HTC-2015), Bad Herrenalb, Germany.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-13BF-7 Versions-Permalink: https://hdl.handle.net/21.11116/0000-0001-6D5A-1

Genre: Poster

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Urheber:
Hieke, Stefan Werner¹, Autor
Dehm, Gerhard², Autor
Scheu, Christina¹, Autor

Affiliations:
1Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_2054294
2Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863398