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  Obstacle strength of binary junction due to dislocation dipole formation: An in-situ transmission electron microscopy study

Haghighat, S. M. H., & Schäublin, R. E. (2015). Obstacle strength of binary junction due to dislocation dipole formation: An in-situ transmission electron microscopy study. Journal of Nuclear Materials, 465, 648-652. doi:10.1016/j.jnucmat.2015.06.054.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0028-35B9-9 Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0028-35BA-7
Genre: Journal Article

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 Creators:
Haghighat, Seyed Masood Hafez1, 2, Author              
Schäublin, Robin E.3, 4, Author              
Affiliations:
1Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863381              
2Ecole Polytechnique Fédérale de Lausanne (EPFL), Centre de Recherches en Physique des Plasmas, Association Euratom-Confédération Suisse, Villigen PSI, Switzerland, ou_persistent22              
3Ecole Polytechnique Fédérale de Lausanne (EPFL), Centre de Recherches en Physique des Plasmas, Association Euratom-Confédération Suisse, CH 5232 Villigen PSI, Switzerland, ou_persistent22              
4Laboratory of Metal Physics and Technology, Department of Materials, ETH Zurich, Zurich, Switzerland, ou_persistent22              

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Language(s): eng - English
 Dates: 2015-07-022015-10
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: -
 Identifiers: DOI: 10.1016/j.jnucmat.2015.06.054
 Degree: -

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Title: Journal of Nuclear Materials
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 465 Sequence Number: - Start / End Page: 648 - 652 Identifier: ISSN: 0022-3115
CoNE: /journals/resource/954925416962