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  Nanofabrication of diffractive elements for soft x-ray and extreme ultraviolet applications using ion beam lithography

Lenz, J., Wilhein, T., & Irsen, S. (2009). Nanofabrication of diffractive elements for soft x-ray and extreme ultraviolet applications using ion beam lithography. Applied Physics Letters, 95(19).

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-60FD-7 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-60FE-5
Genre: Journal Article

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Lenz, J.1, Author           
Wilhein, T., Author
Irsen, S.1, Author           
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1Electron Microscopy and Analytics, Center of Advanced European Studies and Research (caesar), Max Planck Society, ou_2173680              

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 Abstract: In the soft x-ray (SXR) and extreme ultraviolet (EUV) spectral region, optical elements are mainly based on diffractive structures. We report on experiments showing the fabrication of such element, Using ion beam lithography. This allows single-step milling of freestanding transmission as well as reflection gratings. Minimum structure sizes of 70 nm were achieved. The optical elements were tested in slit. grating spectrographs at in ethanol-jet laser-induced plasma source. Relative spectral resolutions of lambda/Delta lambda approximate to 100 were observed in the SXR- and EUV-region. (C) 2009 American Institute of Physics. [doi: 10.1063/1 3258655]

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 Dates: 2009
 Publication Status: Issued
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 Identifiers: ISI: ISI:000272756600014
ISSN: 0003-6951
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Title: Applied Physics Letters
  Alternative Title : Appl. Phys. Lett.
Source Genre: Journal
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Pages: - Volume / Issue: 95 (19) Sequence Number: - Start / End Page: - Identifier: -