Sputtering Yield Dependence on Ion Mass at Low Energy for Ta and W

Hechtl, E.; Varga, P.; Bohdansky, J.; Roth, J.

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Sputtering Yield Dependence on Ion Mass at Low Energy for Ta and W

Hechtl, E., Varga, P., Bohdansky, J., & Roth, J. (n.d.). Sputtering Yield Dependence on Ion Mass at Low Energy for Ta and W. In Symposium on Sputtering (pp. 834).

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-A391-4 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-A392-2

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Urheber:
Hechtl, E.¹, Autor
Varga, P.¹, Autor
Bohdansky, J.², Autor
Roth, J.^{2, 3, 4}, Autor

Affiliations:
1External Organizations, ou_persistent22
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
3Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856327
4Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328