A Contribution to the Sorption of O and CO on Si(111)

Onsgaard, J.; Heiland, W.; Taglauer, E.

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A Contribution to the Sorption of O and CO on Si(111)

Onsgaard, J., Heiland, W., & Taglauer, E. (n.d.). A Contribution to the Sorption of O and CO on Si(111). In Symposium on Atomic and Surface Physics. SASP '80 (pp. 46-51).

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-A3F6-4 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-A3F7-2

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Creators:
Onsgaard, J.¹, Author
Heiland, W.^{2, 3}, Author
Taglauer, E.^{2, 3, 4, 5}, Author

Affiliations:
1External Organizations, ou_persistent22
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
3Experimental Plasma Physics 2 (E2), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856292
4Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856327
5Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328

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Title: Symposium on Atomic and Surface Physics. SASP '80

Place of Event: Maria Alm (AT)

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Title: Symposium on Atomic and Surface Physics. SASP '80

Source Genre: Proceedings

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Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 46 - 51 Identifier: -