Oxygen Exposure Effect on Sputtering Yield and Angular Distribution for 
Light-Ion Irradiation of Polycrystalline Molybdenum

Saidoh, M.; Bay, H.L.; Bohdansky, J.; et al.,

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Oxygen Exposure Effect on Sputtering Yield and Angular Distribution for Light-Ion Irradiation of Polycrystalline Molybdenum

Saidoh, M., Bay, H., Bohdansky, J., & et al. (1986). Oxygen Exposure Effect on Sputtering Yield and Angular Distribution for Light-Ion Irradiation of Polycrystalline Molybdenum. Nuclear Instruments and Methods in Physics Research. B, 13, 403.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-A43D-B Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-A43E-9

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Urheber:
Saidoh, M.¹, Autor
Bay, H.L.¹, Autor
Bohdansky, J.², Autor
et al.¹, Autor

Affiliations:
1External Organizations, ou_persistent22
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288