Development of Surface Topography Due to Gas Ion Implantation

Scherzer, B.M.U.; Behrisch, R.

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Development of Surface Topography Due to Gas Ion Implantation

Scherzer, B., & Behrisch, R. (1983). Development of Surface Topography Due to Gas Ion Implantation. In Sputtering by Particle Bombardment (pp. 271). Springer.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-A449-F Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-A44A-D

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Urheber:
Scherzer, B.M.U.¹, Autor
Behrisch, R.², Autor

Affiliations:
1External Organizations, ou_persistent22
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288