Development of Surface Topography Due to Gas Ion Implantation

Scherzer, B.M.U.; Behrisch, R.

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Development of Surface Topography Due to Gas Ion Implantation

Scherzer, B., & Behrisch, R. (1983). Development of Surface Topography Due to Gas Ion Implantation. In Sputtering by Particle Bombardment (pp. 271). Springer.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-A449-F Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-A44A-D

Genre: Book Chapter

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Creators:
Scherzer, B.M.U.¹, Author
Behrisch, R.², Author

Affiliations:
1External Organizations, ou_persistent22
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Dates: Date issued: 1983

Publication Status: Issued

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Title: Sputtering by Particle Bombardment

Source Genre: Book

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Publ. Info: Springer

Pages: - Volume / Issue: Vol. 2 Sequence Number: - Start / End Page: 271 Identifier: -