Depth Profiling of the Altered Layer in Ta_sub.2_O_sub.5 Produced by Sputtering 
with He Ions

Varga, P.; Taglauer, E.

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Depth Profiling of the Altered Layer in Ta_sub.2_O_sub.5 Produced by Sputtering with He Ions

Varga, P., & Taglauer, E. (1984). Depth Profiling of the Altered Layer in Ta_sub.2_O_sub.5 Produced by Sputtering with He Ions. Nuclear Instruments and Methods in Physics Research. A, 230, 800.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-A4B5-E Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-A4B6-C

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Urheber:
Varga, P.¹, Autor
Taglauer, E.², Autor

Affiliations:
1External Organizations, ou_persistent22
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288