Depth Profiling of the Altered Layer in Ta_sub.2_O_sub.5 Produced by Sputtering 
with He Ions

Varga, P.; Taglauer, E.

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Depth Profiling of the Altered Layer in Ta_sub.2_O_sub.5 Produced by Sputtering with He Ions

Varga, P., & Taglauer, E. (1984). Depth Profiling of the Altered Layer in Ta_sub.2_O_sub.5 Produced by Sputtering with He Ions. Nuclear Instruments and Methods in Physics Research. A, 230, 800.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-A4B5-E Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-A4B6-C

Genre: Journal Article

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Creators:
Varga, P.¹, Author
Taglauer, E.², Author

Affiliations:
1External Organizations, ou_persistent22
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Dates: Date issued: 1984

Publication Status: Issued

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Title: Nuclear Instruments and Methods in Physics Research. A

Source Genre: Journal

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Pages: - Volume / Issue: 230 Sequence Number: - Start / End Page: 800 Identifier: -