Bombardon: Apparatus for Investigating the Influence of 5_keV - 20_keV Ions on 
Metal Targets

Eckstein, W.; Verbeek, H.

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Bombardon: Apparatus for Investigating the Influence of 5_keV - 20_keV Ions on Metal Targets

Eckstein, W., & Verbeek, H. (1973). Bombardon: Apparatus for Investigating the Influence of 5_keV - 20_keV Ions on Metal Targets. Vacuum, 23, 5, 159-162.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-B3EE-C Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-B3EF-A

Genre: Journal Article

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Creators:
Eckstein, W.¹, Author
Verbeek, H.¹, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Dates: Date issued: 1973

Publication Status: Issued

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Title: Vacuum

Source Genre: Journal

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Pages: - Volume / Issue: 23, 5 Sequence Number: - Start / End Page: 159 - 162 Identifier: -