Secondary-Ion Mass Spectrometry and its Use in Depth Profiling

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Secondary-Ion Mass Spectrometry and its Use in Depth Profiling

Liebl, H. (1975). Secondary-Ion Mass Spectrometry and its Use in Depth Profiling. Journal of Vacuum Science and Technology, 12, 1, 385-391.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-B7F2-D Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-B7F3-B

Genre: Journal Article

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Creators:
Liebl, H.¹, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Dates: Date issued: 1975

Publication Status: Issued

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Title: Journal of Vacuum Science and Technology

Source Genre: Journal

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Pages: - Volume / Issue: 12, 1 Sequence Number: - Start / End Page: 385 - 391 Identifier: -