Ion Induced Silicide Formation in Niobium Thin Films

Matteson, S.; Roth, J.; Nicolet, M.A.

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Ion Induced Silicide Formation in Niobium Thin Films

Matteson, S., Roth, J., & Nicolet, M. (1979). Ion Induced Silicide Formation in Niobium Thin Films. In Ion Beam Modification of Materials, Vol. 2 (pp. 1255-1267).

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-BAB1-9 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-BAB2-7

Genre: Conference Paper

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Creators:
Matteson, S.¹, Author
Roth, J.², Author
Nicolet, M.A.¹, Author

Affiliations:
1External Organizations, ou_persistent22
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Dates: Date issued: 1979

Publication Status: Issued

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Title: Ion Beam Modification of Materials, Vol. 2

Place of Event: Budapest (HU)

Start-/End Date: 1978-09-04 - 1978-09-08

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Title: Ion Beam Modification of Materials, Vol. 2

Source Genre: Proceedings

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Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 1255 - 1267 Identifier: -