Reduction of Ion Sputtering Yield by Special Surface Microtopography

Ziegler, J.F.; Cuomo, J.J.; Roth, J.

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Reduction of Ion Sputtering Yield by Special Surface Microtopography

Ziegler, J., Cuomo, J., & Roth, J. (1977). Reduction of Ion Sputtering Yield by Special Surface Microtopography. Applied Physics Letters, 30, 6, 268-271.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-BB9F-9 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-BBA0-3

Genre: Journal Article

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Creators:
Ziegler, J.F.¹, Author
Cuomo, J.J.¹, Author
Roth, J.², Author

Affiliations:
1External Organizations, ou_persistent22
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Dates: Date issued: 1977

Publication Status: Issued

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Title: Applied Physics Letters

Source Genre: Journal

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Pages: - Volume / Issue: 30, 6 Sequence Number: - Start / End Page: 268 - 271 Identifier: -